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BEGIN:VEVENT
DTSTAMP:20260905T204409Z
LAST-MODIFIED:20140401T135055Z
DTSTART:20140411T160000Z
DTEND:20140411T170000Z
UID:event1262@bu.edu
URL:http://physics.bu.edu/internal/events/show/1262
SUMMARY:Quench Condensed Atomic Calligraphy
DESCRIPTION:Featuring Dr. Matthias Imboden\, ECE\, Boston University\nHoste
	d by: Ophelia Tsui\n\nPart of the Biophysics/Condensed Matter Seminar Serie
	s.\n\nAbstract:\nThe Fab on a Chip approach is a novel fabrication techniqu
	e that leverages the control and stability of MEMS machines to fabricate st
	ructures on the nano-scale. This contrasts to standard deep-UV and e-beam l
	ithography methods typically used today. We are developing a method of nano
	-fabrication that can be operated in a cryostat to enable novel physics exp
	eriments.\nTo this end\, we built MEMS-based machines that mimic typical ma
	croscopic tools found in a modern nano-fabrication facility. The central co
	mponent of the micro-fab is the writer. This dynamic stencil is controlled 
	by orthogonal electrostatic comb drives. A central mask and aperture are po
	sitioned with nanometer accuracy\, allowing for the precise placement of th
	e desired material (lithographic mask). The intensity of the incoming atom 
	flux is measured with a MEMS-based mass sensor (film thickness monitor). Wh
	ereas a large atom flux is achieved through a conventional source\, a micro
	 heater can supply a small number of atoms to customize a device (source). 
	Between the aperture and source\, a MEMS shutter controls the precise timin
	g of the incoming atoms. Thermal sensors and heaters provide further inform
	ation of the state of the fab and give critical feedback control.\nThe low 
	power and small footprint enable the setup to function in a cryogenic envir
	onment. We demonstrate basic functionality of the elements at liquid-helium
	 temperatures. The advantage of resist-free lithography and of the depositi
	on being the final fabrication step is the ability to pattern materials inc
	ompatible with standard techniques. Furthermore\, the ultra-clean environme
	nt is suited for high-purity fabrication of structures made of exotic mater
	ials such as lithium\, with the intent to enable novel electron-transport e
	xperiments.\nThe current status of this fabrication method will be presente
	d\, with focus on the dynamics of the aperture-shutter ensemble and on patt
	erned structures made at cryogenic temperatures.
LOCATION:SCI 352\, 590 Commonwealth Avenue\, 02215
STATUS:CONFIRMED
CLASS:PUBLIC
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